JPH0514507Y2 - - Google Patents
Info
- Publication number
- JPH0514507Y2 JPH0514507Y2 JP1986095749U JP9574986U JPH0514507Y2 JP H0514507 Y2 JPH0514507 Y2 JP H0514507Y2 JP 1986095749 U JP1986095749 U JP 1986095749U JP 9574986 U JP9574986 U JP 9574986U JP H0514507 Y2 JPH0514507 Y2 JP H0514507Y2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- plasma
- electrode
- reaction
- lower electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986095749U JPH0514507Y2 (en]) | 1986-06-23 | 1986-06-23 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986095749U JPH0514507Y2 (en]) | 1986-06-23 | 1986-06-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS633139U JPS633139U (en]) | 1988-01-11 |
JPH0514507Y2 true JPH0514507Y2 (en]) | 1993-04-19 |
Family
ID=30960683
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986095749U Expired - Lifetime JPH0514507Y2 (en]) | 1986-06-23 | 1986-06-23 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0514507Y2 (en]) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52123173A (en) * | 1976-04-08 | 1977-10-17 | Fuji Photo Film Co Ltd | Sputter etching method |
JPS5582438A (en) * | 1978-12-15 | 1980-06-21 | Nec Corp | Plasma etching device |
-
1986
- 1986-06-23 JP JP1986095749U patent/JPH0514507Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS633139U (en]) | 1988-01-11 |
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